Electron Microscopy, NMR & Mass Spectometry News

JPS-9030: The XPS for high-speed, high-precision depth profiling

In recent years, there has been a growing demand to perform high quality surface analysis quickly, easily and reproducibly on any kind of sample for any level user. The JPS-9030 is equipped with a newly-designed user interface that further improves operability and also debuts a sophisticated, new modern and sleek exterior design.

Main Features

1. Depth profiling optimized for the application
   The newly-developed Kaufman-type etching ion source provides etching rates from 1 nm/min to 100 nm/min (SiO2equivalent), and allows a wide range of settings. It is capable of depth profiles suitable for any application, from measurements demanding precision to processes that require speed. The mounting of the Kaufman-type etching ion source to the specimen exchange chamber facilitates prevention of  contamination of the measurement chamber.
2. Newly-developed software provides even greater ease-of-use
   SpecSurf Ver. 2.0 now incorporates a ribbon-style GUI, offering a user-friendly environment in which all operations can be performed with the mouse. With JEOL’s own automatic qualitative analysis function, it is possible to sequentially perform qualitative, quantitative and chemical state analyses for multiple acquisition points.
3. Ultra-high surface sensitivity
   The JPS-9030 supports techniques like Angle-Resolved XPS (ARXPS) and Total Reflection XPS (TRXPS), and is capable ultra-high sensitive analysis of the top surfaces of 1 nm (standard measurement method 6 nm or more).
4. A wealth of options
   • Monochromatic X-ray sources
   • Argon gas cluster ion source suitable for organic samples
   • Infra-red heating system capable of temperatures of 1,000°C or higher
   • Transfer vessel to protect specimens from exposure to the atmosphere

Main Specifications